The 16th International Conference on Atomic Layer Deposition (ALD 2016) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films. In every year since 2001, the conference has been held alternately in United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will incorporate the Atomic Layer Etching 2016 Workshop, so that delegates at the two events can interact freely. The conference will take place on 24-27 July 2016 at the Convention Centre Dublin, Ireland.
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ALD 2016 is a free software application from the Reference Tools subcategory, part of the Education category.
The app is currently available in English and it was last updated on 2016-07-17. The program can be installed on iOS.
ALD 2016 (version 1.0) has a file size of 2.94 MB and is available for download from our website.
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